Quantum Dot Resists

Quantum dots (QDs) are semiconductor crystals with a nanocrystalline structure that combine the advantages of inorganic and organic semiconductors. Due to their advantages such as small size, easy dispersion, narrow full width at half maximum (FWHM), bright photoluminescence (PL) intensity, easy control of emission wavelength, and convenient preparation, QDs have been investigated in various applications, especially in displays ^[1].

QD resist is a thin film prepared by integrating QDs and resist, suitable for next generation display devices such as QD-OLED (organic light emitting diode), QD-mLED (micro light emitting diode), and QDCF-LCD (quantum dot on color filter-liquid crystal display) fabrication.

Application

At present, the main function of QDs in displays is to convert the blue backlight of LCDs into red and green light, thereby improving the color gamut and brightness of panels. In order to apply QDs to display devices such as mLED, OLEDs, and QLEDs, it is necessary to pattern the QDs film.Direct lithography is a good QD patterning method that can both realize high-resolution and large-area manufacturing at the same time. It can be applied to manufacture millions of pattern elements. One of the simplest ways is to mix QDs directly into photoresists to obtain QD resists.

For example, red and green CdSe/ZnS QDs were studied to mix into poly(methyl methacrylate) (PMMA) photoresist and SU-8 epoxy resin photoresist solution, enabling direct patterning. QD concentration affects exposure dose while the mixing ratio of red and green QDs affects spectral color. The emission and absorption spectra of these two nanocrystals (NCs) in chlorobenzene are characterized in Fig. 1 ^[2].

Fig. 1. Emission and absorption spectra of green and red emitting CdSe/ZnS nanocrystals (NCs) diluted in chlorobenzene ^[2].

Products List

There are two types of QD resist available at Alfa Chemistry, based on InP and Cd, with different photoluminescence (PL) and narrow full width at half maximum (FWHM). Please refer to the table below for the specific parameters of our products.

Product Name	Type	PL	FWHM
PR-QDP001	InP-based	525 nm	40 nm max.	View More
PR-QDP002		630 nm	45 nm max.
PR-QDP003	Cd-based	525 nm	25 nm max.	View More
PR-QDP004		630 nm	30 nm max.

Quantum Dot

Compared to conventional resists, QD resists can further improve light absorption and achieve excellent EQE, which has a good development potential. Alfa Chemistry provides two kinds of QD resists based on InP and Cd. If you need other types of QD resists, please do not hesitate to contact us.

Please kindly note that our products and services are for research use only.