PR-I T85 - Photoresist / Alfa Chemistry

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PR-I T85

PR-I T85

Nanoimprint Lithography Resists

Catalog: PR-SMP-090

Product Name	PR-I T85
Film Thickness	0.3, 1.0, 5.0 μm, customizable to 20 μm (3000 rpm)
Glass transition temperature (Tg)	85 °C
Package	250 ml, 500 ml, 1000 ml, 2500 ml, customized

Description

PR-I T85 is a thermoplastic nanoimprint lithography (NIL) resist based on non-polar cyclo-olefin-copolymers (TOPAS). It has been developed preferably for permanent applications in lab-on-a-chip systems, microfluidics, and microoptical components.

Unique Features

Non-polar thermoplastic.
Excellent film quality.
Beneficial flow behaviour during imprinting, and low imprint pressure.
Excellent UV and optical transparency.

High plasma etch resistance.
High chemical stability, such as high resistance to acids, bases and polar solvents, and no interactions with conventional photoresists.

Applications

Lab-on-a-chip systems
wave guides
Bio applications
Microfluidic

Microoptical elements
Single and multilayer systems
Mask for pattern transfer processes

PR-I T85

Recommended Processing Parameters

Process step	Process parameter
Imprint temperature	130-150 °C
Imprint pressure	5-20 bars
Resist removal	Oxygen plasma

As a manufacturer of photoresists, Alfa Chemistry has been operating for many years. We offer a wide range of photoresists for NIL technologies. In terms of different nanoimprint lithography processes, our products are classified into UV-NIL resists and T-NIL resists. If you have any questions, please feel free to contact us. We stand ready to assist you.

Please kindly note that our products and services are for research use only.