Related Materials - Photoresist / Alfa Chemistry

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Related Materials

In the optoelectronic information field, photolithography is a crucial step in the manufacturing of semiconductor devices, and it has aroused great interest. Although photoresist is a key material for lithography, other related materials which are involved in photolithography are also essential.

Alfa Chemistry is a professional photoresist and related materials supplier. We have an experienced technical team with a strong focus on the research and development of photoresists and related materials.

At Alfa Chemistry, a variety of raw materials for photoresists are available, including monomers, photoresist resins, photoacid generators (PAGs), and other additives.
Alfa Chemistry also provides a series of electronic wet chemicals (also called process chemicals) for photolithography, including adhesion promoters, developers, strippers, etc. As a result of their unique properties, these crucial chemicals can be applied to the corresponding photolithography steps for photoresist attachment, development, stripping, etc. Please click on the links below to learn more details about our products.

Monomers

Photoresist Resins

Photoacid Generators

Additives

Electronic Wet Chemicals

Monomers

Photoresist monomer is the raw material of synthetic resin. Its performance and quality stability affect the resin's performance, and ultimately affect the quality of the photoresist. The molecular weight, functionality, and reactivity of the monomers all contribute to the physical and chemical properties and patternability of the photoresist.

Photoresist Resins

Resin is a vital component of photoresists that affects their properties. When it is exposed to UV light, electron beams, ion beams, X-rays, and other radiation, it undergoes a light-curing reaction, with its solubility and affinity changing as a result of the reaction.

Photoacid Generators

PAG is an integral component of chemically amplified photoresists and is a type of photoinitiator. PAGs are a series of compounds that react to generate specific acids after absorbing light energy. These acids can decompose or cross-link acid-sensitive resins.

Additives

Additives are a series of substances added to the photoresist as components in addition to the main raw materials.

Electronic Wet Chemicals

Electronic wet chemicals include adhesion promoters, developers, strippers, thinners, etchants and stoppers, which perform their specific functions in specific photolithography steps. These functional electronic wet chemicals play a significant role in photolithography.

Alfa Chemistry has been in business for many years as a leading photoresist supplier. In addition to photoresists, we provide high-quality materials related to photoresists and photolithography, including monomers, photoresist resins, PAGs, additives and electronic wet chemicals. Please feel free to contact us with any concerns.

Please kindly note that our products and services are for research use only.