Color Photoresists - Photoresist / Alfa Chemistry

Products

Our customer services representatives are available 24 hours a day, from Monday to Sunday.

Color Photoresists

Color photoresist refers to a type of photoresist based on pigments, including red (R), green (G), and blue (B) photoresist. Color photoresist is composed of colorants, high-molecular polymers, photosensitizers, solvents and other substances. It has etching resistance under ultraviolet or other light irradiation.
Color photoresist is used in flat panel displays (FPDs) to fabricate color filters (CFs) for liquid crystal displays (LCDs). CF is a key component for making color images in color LCD and consists of three main colors: red, green and blue. By coating color photoresist on a glass substrate according to a specific pattern, coloring, exposing, and developing over and over again, the required CF can be obtained.

Composition

The composition formula of color photoresist is similar to conventional photoresist. It is composed of pigments, pigment dispersants, resins, solvents, monomers, photoinitiators, and other additives.

Pigments: Pigments are often used in the form of two or more mixtures, which determine the spectroscopic characteristics of the product.
Pigment dispersants: Pigment dispersants impart dispersion stability to pigments.
Resins: The resin, which is the most important component, has excellent dispersion stability, adhesion, and alkali development properties.
Solvents: Solvents are used to adjust viscosity and dryness of color photoresist.
Monomers: Monomers are used to reduce the viscosity of the photocuring system, and adjust various properties of the color photoresist.
Photoinitiators: The photoinitiator enables the color photoresist to cross-link and cure, and affects the curing rate.
Additives: Taking the leveling agent as an example, it can improve the leveling and uniformity of the color photoresist.

Our Products

Product Name: PR-CF-201A

Catalog: PR-FPD-001

Physical and Chemical Properties
Appearance	Clear liquid
Color	Red, Green, Blue, Yellow, etc.
Transmittance	High
NTSC	98-117%
Viscosity	5-30 cp or customized
Film Uniformity	<3%
Heat Resistance	-20-240 °C
Water Absorption Rate	1.50% (100 °C, 2 h)
Hardness	4 H
Chemical Resistance	Excellent
Process Conditions
Coating Methods	Spin coating, blade coating, printing
Pre-baking Temperature	90-110 °C
Exposure Energy	150-200 mJ/cm²
Development	50-70 s, 25-30 °C
Post Bake/ Hard Bake	120-230 °C, 30-60 min
Package and Storage
Package	A Gallon/drum
Storage	Store in a sealed container at 0-5 °C, away from light.
Shelf Life	3 months

Applications

Our color photoresist features 3 μm manufacturing process, and presents a wide color gamut of more than 98%. As the core material for making CF, it can be applied to automotive charge-coupled device (CCD) projection color lense (or CF), liquid crystal display CF, complementary metal-oxide-semiconductor (CMOS) lense, and other novel CFs.

Color photoresist is mainly used in the manufacture of CF, so it has attracted much attention in the field of FPDs. Alfa Chemistry offers a color photoresist with high color purity, high light transmission and good chemical resistance. If you have any questions, please feel free to contact us.

References

Sabnis, R.W. Color filter technology for liquid crystal displays. Displays. 1999, 20: 119-129.
Koo, H-S.; et al. LCD-based color filter films fabricated by a pigment-based colorant photo resist inks and printing technology. Thin Solid Films. 2006, 515: 896-901.

Please kindly note that our products and services are for research use only.