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Thin Film Transistor Liquid Crystal Display (TFT-LCD) is an optoelectronic product that uses liquid crystal as the medium and TFT as the control element. Its basic configuration is shown in Fig. 1.
TFT-LCD photoresists refer to a class of positive-tone photoresists used in the photolithography process to fabricate TFT devices and form electronic circuits on glass substrates. TFT-LCD positive photoresists have better resolution, high thermal stability, and excellent etching resistance compared with negative-type photoresists, which enable them to play a vital role in the photolithographic process for TFT device fabrication.
Fig. 1. Basic configuration of a TFT-LCD [1]
The basic structure of TFT-LCD contains a TFT substrate and a CF (color filter) substrate. There are three stages in the manufacturing process, including the array process, the cell process, and the module process (or assembly process). Figure 2 shows the overall process. Among them, the array process is the core technology in the entire manufacturing process of TFT-LCD, generally using 4 or 5 Mask photolithography technology to fabricate TFT components. This process requires TFT- LCD photoresist, which serves as the main material.
Fig 2. Typical TFT-LCD fabrication process [1].
Alfa Chemistry supplies customers with TFT-LCD photoresists, which can be used to form intricately detailed circuits on TFTs used in the display industry. We have three different models of products, whose viscosity can be adapted according to customer requirements. Please view specific details about the different models below.
Product Name | Viscosity | Film Thickness | |
High Speed PR-BFP-100 | 7 cP | 1.5 μm | View More |
High Speed PR-BFP-300 | 3.6 cP | 1.5 μm | View More |
High Themal 4-Mask PR | - | 2.2 μm | View More |
Product Name: High Speed PR-BFP-100
Catalog: PR-FPD-005
Properties | |
Film Thickness | 1.5 μm |
Viscosity | 7 cP |
Coating | Spin or slit |
Characteristics | |
Adhension | Good |
Photosensitive Speed | Fast |
Etching Resistance | Excellent |
Remaining Film Thickness | High |
Dark Erosion | Good |
Process Margin | High |
Application | |
Commonly used in the 5th generation line to the 10th generation line, representing the size of the glass substrate from 1100*1300 to 2880*3130 (unit: mm) | |
Applied to TFT Array process, suitable for TN, IPS, ADS and other display technologies. |
Product Name: High Speed PR-BFP-300
Catalog: PR-FPD-006
Properties | |
Film Thickness | 1.5 μm |
Viscosity | 3.6 cP |
Coating | Slit |
Characteristics | |
Adhension | Good |
Photosensitive Speed | Fast |
Etching Resistance | Excellent |
Remaining Film Thickness | High |
Dark Erosion | Good |
Process Margin | High |
Application | |
Commonly used in the 5th generation line to the 10th generation line, representing the size of the glass substrate from 1100*1300 to 2880*3130 (unit: mm) | |
Applied to TFT Array process, suitable for TN, IPS, ADS and other display technologies. |
Product Name: High Themal 4-Mask PR
Catalog: PR-FPD-007
Properties | |
Film Thickness | 2.2 μm |
Lithography Process | 4-MASK |
Characteristics | |
H/T Profile | 40-45° |
Thermal | 140 °C |
Thermal stability | Strong |
Heat Resistance | Excellent |
Process Margin | Wide |
Halftone Uniformity | Excellent (Hard bake) |
Application | |
Applied to TFT Array process, suitable for TN, IPS, ADS and other display technologies. |
Alfa Chemistry offers TFT-LCD photoresists for TFT device fabrication. There are several excellent characteristics of our TFT positive photoresists, including good coating uniformity, low film loss, good sensitivity, a wide process window, and good adhesion. If you are in need, please feel free to contact us.
Reference
Please kindly note that our products and services are for research use only.
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