TFT-LCD Photoresists

TFT-LCD Photoresists

Thin Film Transistor Liquid Crystal Display (TFT-LCD) is an optoelectronic product that uses liquid crystal as the medium and TFT as the control element. Its basic configuration is shown in Fig. 1.

TFT-LCD photoresists refer to a class of positive-tone photoresists used in the photolithography process to fabricate TFT devices and form electronic circuits on glass substrates. TFT-LCD positive photoresists have better resolution, high thermal stability, and excellent etching resistance compared with negative-type photoresists, which enable them to play a vital role in the photolithographic process for TFT device fabrication.

Basic configuration of a TFT-LCDFig. 1. Basic configuration of a TFT-LCD [1]

Application in TFT-LCD Fabrication

The basic structure of TFT-LCD contains a TFT substrate and a CF (color filter) substrate. There are three stages in the manufacturing process, including the array process, the cell process, and the module process (or assembly process). Figure 2 shows the overall process. Among them, the array process is the core technology in the entire manufacturing process of TFT-LCD, generally using 4 or 5 Mask photolithography technology to fabricate TFT components. This process requires TFT- LCD photoresist, which serves as the main material.

Typical TFT-LCD fabrication processFig 2. Typical TFT-LCD fabrication process [1].

Our Products List

Alfa Chemistry supplies customers with TFT-LCD photoresists, which can be used to form intricately detailed circuits on TFTs used in the display industry. We have three different models of products, whose viscosity can be adapted according to customer requirements. Please view specific details about the different models below.

Product NameViscosityFilm Thickness
High Speed PR-BFP-1007 cP1.5 μmView More
High Speed PR-BFP-3003.6 cP1.5 μmView More
High Themal 4-Mask PR-2.2 μmView More
Our Products

High Speed PR-BFP-100

High Speed PR-BFP-300

High Themal 4-Mask PR

Product Name: High Speed PR-BFP-100

Catalog: PR-FPD-005

Properties
Film Thickness1.5 μm
Viscosity7 cP
CoatingSpin or slit
Characteristics
AdhensionGood
Photosensitive SpeedFast
Etching ResistanceExcellent
Remaining Film ThicknessHigh
Dark ErosionGood
Process MarginHigh
Application
Commonly used in the 5th generation line to the 10th generation line, representing the size of the glass substrate from 1100*1300 to 2880*3130 (unit: mm)
Applied to TFT Array process, suitable for TN, IPS, ADS and other display technologies.

Product Name: High Speed PR-BFP-300

Catalog: PR-FPD-006

Properties
Film Thickness1.5 μm
Viscosity3.6 cP
CoatingSlit
Characteristics
AdhensionGood
Photosensitive SpeedFast
Etching ResistanceExcellent
Remaining Film ThicknessHigh
Dark ErosionGood
Process MarginHigh
Application
Commonly used in the 5th generation line to the 10th generation line, representing the size of the glass substrate from 1100*1300 to 2880*3130 (unit: mm)
Applied to TFT Array process, suitable for TN, IPS, ADS and other display technologies.

Product Name: High Themal 4-Mask PR

Catalog: PR-FPD-007

Properties
Film Thickness2.2 μm
Lithography Process4-MASK
Characteristics
H/T Profile40-45°
Thermal140 °C
Thermal stabilityStrong
Heat ResistanceExcellent
Process MarginWide
Halftone UniformityExcellent (Hard bake)
Application
Applied to TFT Array process, suitable for TN, IPS, ADS and other display technologies.

Alfa Chemistry offers TFT-LCD photoresists for TFT device fabrication. There are several excellent characteristics of our TFT positive photoresists, including good coating uniformity, low film loss, good sensitivity, a wide process window, and good adhesion. If you are in need, please feel free to contact us.

Reference

  1. Ukai, Y. TFT-LCD manufacturing technology — current status and future prospect —. IEEE 2007 International Workshop on Physics of Semiconductor Devices. 2007, 29-34.

Please kindly note that our products and services are for research use only.