Special Manufacture Photoresists - Photoresist / Alfa Chemistry

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Special Manufacture Photoresists

There are also some special manufacture photoresists available at Alfa Chemistry. These photoresists are indispensable special process photoresists in the photolithography process, including electron beam (E-beam) resists, lift-off resists, photosensitive polyimide resists, nanoimprint lithography resists, quantum dot photoresists, and image reverse resists.

E-beam Resists

Lift-Off Resists

Photosensitive Polyimide Resists

Nanoimprint Lithography Resists

Quantum Dot Resists

Image Reverse Resists

E-beam resists

E-beam resists mainly use focused electron beams to expose and obtain patterns through development. The electron beam photolithography in which they are involved is characterized by high resolution and flexibility. Traditional electron beam photolithography uses a direct writing mode, which is simple and flexible without a photomask. But the disadvantage may be that the production efficiency is too low.

Lift-off resists

Lift-off resist refers to photoresist used in lift-off lithography. Lift-off lithography reduces the step of etching compared with traditional photolithography, and the process flow is to first obtain a photoresist film by photolithography on the substrate, and then metalizing to obtain a metal layer on the photoresist. Finally, the metal layer is stripped off by stripping the photoresist.

Photosensitive polyimide resists

Photosensitive polyimide resist is one of the photoresist materials with photosensitive properties. Polyimide is a polymer of imide monomers containing two acyl groups bonded to nitrogen that can be widely used in the electronics and semiconductor industries due to its excellent thermal resistance. Photosensitive polyimide resist, as a kind of photoresist, has been rapidly developed for emerging fields such as advanced packaging, micro-electromechanical systems, and organic light-emitting diode (OLED) displays.

Nanoimprint lithography resists

The photoresists used in the nanoimprint lithography process are called nanoimprint lithography resists. Nanoimprint lithography technology is regarded as one of the most promising third-generation lithography technologies in micro-nano fabrication. This is a cheap and simple nanolithography technique for fabricating nanometer-scale patterns. The pattern transfer is first completed by contact imprinting, and then the structure is transferred to other materials through etching. Nanoimprint lithography overcomes the resolution limit problem caused by optical diffraction during exposure, and demonstrates the advantages of ultra-high resolution, high efficiency, and low cost.

Quantum dot resists

Quantum dot technology is currently used for the best high color gamut solutions and plays an important role in display applications. Quantum dot resist can be prepared by dispersing quantum dots in a photoresist system. Compared with conventional photoresists, this resist has obvious advantages in color purity and light conversion efficiency. Therefore, it is suitable for preparing quantum dot-OLED, quantum dot-micro light emitting diode (mLED), quantum dot on color filter-liquid crystal display (LCD), and other new generation display devices.

Image reverse resists

Image reverse resists can be used as positive photoresists or negative photoresists, depending on the actual needs of the photolithography process. The image reversal involves two steps of reverse baking and flood exposure, which not only make the previously exposed area insoluble in the developer but also enable the unexposed area to be exposed. Without these two steps, the photoresist exhibits a similar sidewall structure to the normal positive resist. The image reverse resist during the image reversal process demonstrates a profile shape of the undercut sidewall structure that facilitates lift-off.

Alfa Chemistry has been committed on the research of photoresists and their applications for many years. As a leading supplier of photoresists, Alfa Chemistry provides several special manufacture photoresists. If you have any needs, please feel free to contact us.

Please kindly note that our products and services are for research use only.