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Photoresist monomers are made of basic chemicals and are one of the core raw materials for photoresist synthesis. They can be polymerized to form the film-forming resin required for photoresists. The performance indicators of photoresist monomers are purity, moisture, acid value, simple impurities, metal ion content, etc. It is worth noting that semiconductor-grade photoresist monomers are more difficult to synthesize than general monomers. They have higher requirements, such as more stable quality and fewer metal ion impurities. Depending on the monomer structure, photoresist monomers are synthesized by different methods and with different synthesis difficulties.
Alfa Chemistry has a first-class R&D team that has rich experience in compound customization. We offer comprehensive monomer custom synthesis services supported by a scientific and comprehensive process system and quality control system. Our tailored customization services assist clients in minimizing both capital and time expenditures.
Alfa Chemistry has extensive experience in monomer customization. We possess state-of-the-art laboratories and a team of experienced R&D professionals. As part of our monomer customization services, we provide customers with both custom synthesis and custom modification, as well as comprehensive characterization data for the end products.
Custom items | Summary | Deliver results |
Custom synthesis | Customers provide the structural diagram of the compound, and we design the synthesis route and synthesize the corresponding monomers. |
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Custom modification | Customers provide compounds and modification requirements, and we design the modified route and provide structurally modified monomers. |
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