Monopotassium phosphite

• CAS: 13977-65-6
• Catalog Number: ACM13977656
• Category: Main Products
• Molecular Weight: 120.09
• Molecular Formula: H2KO3P
• Description: Monopotassium phosphite in mixture with dipotassium phosphite is primarily a water-soluble fungicide.
• Synonyms: Potassium dihydrogen phosphite
• Appearance: solid
• Storage: Store at 2-8 ℃
• EC Number: 604-162-9
• HS Code: 2835100000
• LogP: -0.37160

Case Study

The Possible Use of Monopotassium Phosphite as Fertilizer

Wollenweber B, et al. Monopotassium phosphite[J]. 2011.

Monopotassium phosphite is a phosphite salt.
Role of Phosphite
· Phosphite (Phi) compounds have been recognized for a long time as fungicides for controlling plant diseases caused by Oomycetes.
· Plant growth could be improved by Phi-application.
· Foliar application of Phi increased yield and improved the quality of several crops.
· Phosphite-containing chemicals are offered as fertilizers suitable for use in organic farming.
· Many new P-fertilizers based on Phi are now being marketed and registered under the fertilizer laws.

Crystal Structure Study of Zirconium Iodide

Rossi, Matthew L., et al. Journal of nuclear materials, 2013, 433(1-3), 30-36.

Iodides formed by the reaction of molecular or atomic iodine with zirconium and zirconium alloys can be used as cladding materials for the manufacture of nuclear fuel rods. Stress corrosion cracking (SCC) is related to the chemical reaction of fission products in the cladding material and is a major problem in the nuclear fuel life cycle. This work studies the first principles equation of state of several zirconium iodides ZrI2, ZrI3 and ZrI4 and applies various methods to introduce dispersion correction.
Van der Waals corrections are crucial for accurately modeling ZrI4, a compound relevant to iodine-influenced stress corrosion cracking (ISCC). Uncorrected DFT calculations overestimate the system volume, potentially leading to inaccurate predictions of volatilization rates and iodine agglomeration.
While the bulk moduli calculated in this work may not be experimentally verified, they provide valuable insights. All zirconium iodide phases exhibit significantly lower bulk moduli than the oxide phase. The low bulk modulus of ZrI4, especially at reactor temperatures, may facilitate volatilization and contribute to pit formation.
Dispersion-corrected models predict higher resistance to strain compared to uncorrected approaches. This is attributed to stronger I-I interactions, which influence the crystal's response to strain. During expansion, the crystals tend to separate along I-I bonds while maintaining Zr-I coordination. This mechanism could potentially facilitate further iodine penetration into the zirconium lattice and increase iodine coordination of zirconium.

Zirconium Tetraiodide and Ozone Used for Atomic Layer Deposition of Zirconium Dioxide Film

Kukli, Kaupo, et al. ECS Journal of Solid State Science and Technology, 2018, 7(2), P1.

Zirconium oxide (ZrO2) thin films can be successfully grown by atomic layer deposition (ALD) through alternating surface reactions of zirconium tetraiodide (ZrI4) and ozone (O3) precursors. The prepared dense and continuous ZrO2 thin films have a dielectric constant as high as 19 and exhibit saturation magnetization under an external magnetic field.
Preparation procedure of ZrO2 films from ZrI4 and O3
· The films were grown in a flow-type hot-wall reactor F120 from ZrI4 and O3. Growth temperatures were in the range of 250-400◦C. ZrI4 was evaporated at 240◦C from an open boat inside the reactor, and transported to the substrates by the N2 carrier gas flow. Ozone was produced with an ozone generator from oxygen (99.999%). The estimated ozone concentration output of the generator was about 100 g/m3. The cycle times used were 0.5-0.5-2.0-0.5 s, denoting the sequence ZrI4 pulse-purge-O3 pulse-purge.
· The substrates were 5 × 5 cm × cm pieces, as maximum, cut out of undoped Si(100) covered with a 1.5-2.0 nm thick wet-chemically grown SiO2. The number of deposition cycles was varied between 30 and 500. In addition, also conducting substrates were used for the deposition of ZrO2, based on (100) silicon with resistivity 0.014- 0.020 · cm, i.e., boron-doped to concentration up to 5 × 10¹⁸ -1 × 10¹⁹/cm3, and coated with 10 nm thick chemical vapor deposited titanium nitride layer.

Custom Q&A

What is the molecular formula of Monopotassium phosphite?

The molecular formula is H2KO3P.

What are the synonyms of Monopotassium phosphite?

The synonyms are potassium dihydrogenphosphite, J-522709, and Q6901900.

What is the molecular weight of Monopotassium phosphite?

The molecular weight is 120.086 g/mol.

What are the component compounds of Monopotassium phosphite?

The component compounds are CID 107909 (Phosphorane, trihydroxy-) and CID 5462222 (Potassium).

When was Monopotassium phosphite created?

It was created on February 5, 2008.

When was Monopotassium phosphite last modified?

It was last modified on October 21, 2023.

What is the IUPAC Name of Monopotassium phosphite?

The IUPAC Name is potassium;dihydrogen phosphite.

What is the InChI of Monopotassium phosphite?

The InChI is InChI=1S/K.H2O3P/c;1-4(2)3/h;1-2H/q+1;-1.

What is the InChIKey of Monopotassium phosphite?

The InChIKey is BZHCGFBZBPVRFE-UHFFFAOYSA-N.

What are the other identifiers of Monopotassium phosphite?

The other identifiers are Nikkaji Number J44.279H and Wikidata Q6901900.