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Nanofabrication Service—Plasma Enhanced Chemical Vapor Deposition (PECVD) System

Nanofabrication is the high point of global competition in manufacturing technology, aiming to provide specific functions for products and devices through nano-precision manufacturing, nano-scale manufacturing, and cross-scale manufacturing. The development of nanofabrication technology has enabled the movement of manufacturing objects from the macroscopic to the mesoscopic and microscopic, resulting in a deeper study of manufacturing science and an expansion of the intersection and integration of different disciplines. Alfa Chemistry provides nanofabrication services to our customers based on Plasma Enhanced Chemical Vapor Deposition (PECVD) System.

Name Of The Instrument/Platform

Plasma Enhanced Chemical Vapor Deposition (PECVD) System

MANUFACTURER: Trion Orion III

Summary

This deposition system (Trion Orion III) provides plasma-enhanced chemical vapor deposition of thin films. Current capabilities include precursor gases for deposition of SiO2, Si3N4, and amorphous silicon films.

Alfa Chemistry is dedicated to the development of new manufacturing theories, methods, and processes that enable deeper research in manufacturing science. Our Plasma Enhanced Chemical Vapor Deposition (PECVD) System-based nanofabrication services will provide you with the most solid support for your materials research. If you are interested, please feel free to contact us.

For research use only, not intended for any clinical use.

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