Nanofabrication is the high point of global competition in manufacturing technology, aiming to provide specific functions for products and devices through nano-precision manufacturing, nano-scale manufacturing, and cross-scale manufacturing. The development of nanofabrication technology has enabled the movement of manufacturing objects from the macroscopic to the mesoscopic and microscopic, resulting in a deeper study of manufacturing science and an expansion of the intersection and integration of different disciplines. Alfa Chemistry provides nanofabrication services to our customers based on Cambridge Nano Fiji 200-ALD.
Cambridge Nano Fiji 200-ALD
Cambridge Nano Fiji 200-A loadlocked ALD system with thermal and plasma deposition capabilities, 5 metal-organic precursors and up to 8" wafer sample size. The system is capable of operating in "exposure mode" which allows for deposition in high aspect ratio features.
Available Recipes: Al2O3, HfO2, AlN, Pt, Ru, TiN, TiO2, ZrO2 and SiO2.
Charge rate is per ALD run (24hr.) plus the precursor used for that run.
Current precursors loaded:
0-H2O
1-Hf Valve open
2-Al Valve open
3-Zr Valve open
4-Si Valve open
5-Ti Valve open
Cambridge Nano Fiji 200-ALD system with thermal, plasma, and exposure (allows for deposition in high aspect ratio features) deposition capabilities.
Alfa Chemistry is dedicated to the development of new manufacturing theories, methods, and processes that enable deeper research in manufacturing science. Our Cambridge Nano Fiji 200-ALD-based nanofabrication services will provide you with the most solid support for your materials research. If you are interested, please feel free to contact us.
For research use only, not intended for any clinical use.
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