Hexyltrimethoxysilane

• CAS: 3069-19-0
• Catalog Number: ACM3069190-4
• Category: Main Products
• Molecular Weight: 206.35
• Molecular Formula: C9H22O3Si
• Description: Liquid
• Synonyms: n-Hexyltrimethoxysilane
• IUPAC Name: hexyl(trimethoxy)silane
• Canonical SMILES: CCCCCC[Si](OC)(OC)OC
• InChI: InChI=1S/C9H22O3Si/c1-5-6-7-8-9-13(10-2,11-3)12-4/h5-9H2,1-4H3
• InChI Key: CZWLNMOIEMTDJY-UHFFFAOYSA-N
• Boiling Point: 203 °C
• Flash Point: 77 °C
• Solubility: Insoluble in water.
• Appearance: Colorless to almost colorless clear liquid
• Storage: Store under inert gas
• Complexity: 107
• Covalently-Bonded Unit Count: 1
• EC Number: 221-331-9
• Exact Mass: 206.133821g/mol
• Formal Charge: 0
• Hazard Statements: H315 : Causes skin irritation.; H319 : Causes serious eye irritation.
• H-Bond Acceptor: 3
• H-Bond Donor: 0
• Heavy Atom Count: 13
• MDL Number: MFCD00039801
• Monoisotopic Mass: 206.133821g/mol
• Packaging: 10 g; 100 g
• Physical State: Liquid
• Precautionary Statements: P264 : Wash skin thoroughly after handling.; P280 : Wear protective gloves/ eye protection/ face protection.; P302 + P352 : IF ON SKIN: Wash with plenty of water.; P337 + P313 : If eye irritation persists: Get medical advice/ attention.; P362 + P364 : Take off contaminated clothing and wash it before reuse.; P332 + P313 : If skin irritation °Ccurs: Get medical advice/ attention.
• PubChem ID: 87571236
• Rotatable Bond Count: 8
• Signal Word: Warning
• Specific Gravity: 0.92
• UNII: 9AUI936HIC

Case Study

Hexyltrimethoxysilane for the Synthesis of Hydrophobic Submicron Hybrid Silica Particles

Yamauchi N, et al. Colloids and Surfaces A: Physicochemical and Engineering Aspects, 2018, 553, 253-258.

This study outlines a synthesis method for creating hydrophobic submicron hybrid silica particles through the co-reaction of tetraethyl orthosilicate (TEOS) and hexyltrimethoxysilane (HTMS). These precursors were dissolved in diethylamine, serving both as a Lewis base catalyst and an amphiphilic solvent. Diethylamine plays a crucial role in facilitating the formation of silica particles with a hydrophobic surface, allowing them to be stably dispersed in non-polar solvents like hexane.
Experimental Methodology: The reaction begins by dissolving TEOS and HTMS in diethylamine at a molar ratio totaling 10 mmol, followed by the addition of water (0.46 mol) as a hydrolysis agent. The mixture was subjected to ultrasonic treatment using a horn-type ultrasonic homogenizer at 750 W and 20 kHz for 30 seconds, promoting uniform dispersion and reaction kinetics. After the sonication process, the reaction mixture was sealed and left undisturbed at 25 °C for 24 hours, allowing the gradual formation of a stable dispersion of hybrid silica particles.
The articles were isolated through a series of washing steps, using methyl isobutyl ketone and ethanol to remove unreacted precursors and impurities. Finally, ethanol was removed by air-drying to yield powder-form hybrid silica particles.

Hexyltrimethoxysilane for the Synthesis of Silica Membrane for Iodine-Sulfur Thermochemical Water Splitting

Myagmarjav O, et al. International Journal of Hydrogen Energy, 2017, 42(9), 6012-6023.

This study investigates the development of a hydrogen-selective silica membrane derived from hexyltrimethoxysilane (HTMOS) for use in thermochemical water splitting within the iodine-sulfur (I-S) process. The HTMOS membrane was prepared via counter-diffusion chemical vapor deposition (CVD) on a porous γ-alumina-coated α-alumina support tube, designed to maximize hydrogen permeability while restricting other gas flows.
Experimental Methodology: A thin silica layer was deposited onto a γ-alumina-coated α-alumina support using HTMOS as the silicon precursor and oxygen as the reactive gas. The CVD process was crucial in ensuring uniform membrane formation, as it relied on limited diffusion within the porous structure to halt deposition. This counter-diffusion method enabled precise control over membrane thickness and uniformity.
The HTMOS vapor was generated by passing nitrogen gas through a heated bubbler at 125°C, regulating the vapor concentration via nitrogen flow rate and bubbler temperature. Oxygen was introduced to the tube's interior at a constant flow of 100 mL/min. The heated pipes prevented condensation of HTMOS vapor, ensuring efficient delivery to the reaction zone.

Custom Reviews

August 05, 2023

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High purity
After receiving hexyltrimethoxysilane, it was found that the purity of hexyltrimethoxysilane was very high, which met the expected purity.

Custom Q&A

What is the Molecular formula of Hexyltrimethoxysilane?

C9H22O3Si

What is the Molecular weight of Hexyltrimethoxysilane?

206.35

What is the EC number of Hexyltrimethoxysilane?

221-331-9

What is the InChIKey of Hexyltrimethoxysilane?

CZWLNMOIEMTDJY-UHFFFAOYSA-N

What is the SMILES of Hexyltrimethoxysilane?

CCCCCC[Si](OC)(OC)OC

What is the Appearance of Hexyltrimethoxysilane?

Colorless to almost colorless clear liquid

What is the Application of Hexyltrimethoxysilane?

Hexyltrimethoxysilane is a typical silane coupling agent. One of the molecules contains hexane, which makes it show excellent physical and chemical properties. It has a wide range of applications, such as: It is used in the modification of nylon, PBT and other engineering plastics, which can improve the mechanical strength of modified plastics. The surface treatment of silicon powder is used to strengthen epoxy resin molding Chemicalbook material, epoxy resin mortar, epoxy resin mold, etc. The substitute sulfhydrylsilane is used in polysulfide sealant for construction and glass, which has good viscosity increasing effect and avoids uncomfortable odor when using sulfhydrylsilane; When added into polyurethane and latex adhesives, it can significantly improve the adhesion, do not yellowing, do not affect the storage period of the product, and the use effect is better than that of amino silane coupling agent.

What is the Boiling Point of Hexyltrimethoxysilane?

203℃

What is the Storage condition of Hexyltrimethoxysilane?

Store under inert gas

What is the Density of Hexyltrimethoxysilane?

0.92 g/mL at 25℃