Laboratory Services / Alfa Chemistry
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Nanofabrication Service—Transparency Photomask Writer

Nanofabrication is the high point of global competition in manufacturing technology, aiming to provide specific functions for products and devices through nano-precision manufacturing, nano-scale manufacturing, and cross-scale manufacturing. The development of nanofabrication technology has enabled the movement of manufacturing objects from the macroscopic to the mesoscopic and microscopic, resulting in a deeper study of manufacturing science and an expansion of the intersection and integration of different disciplines. Alfa Chemistry provides nanofabrication services to our customers based on Transparency Photomask Writer.

Name Of The Instrument/Platform

Transparency Photomask Writer

MANUFACTURER: Screen USA

MODEL: PlateRite FX870II

Summary

PlateRite FX870II is a laser-based digital writer for writing dry-film transparency photmasks. It can output flexo digital plates, letterpress digital plates and thermal ablative film in any size from 4""×4"" (100 mm × 100 mm) to 30""×34.2"" (762 mm×870 mm). The small 4""×4"" format is perfect for writing low-resolution photomasks to expose 3"" wafers. The minimum recommended feature size is 30 µm for square/rectangular patterns and 50 µm for rounded and oblique patterns. Typical writing time for a 4""×4"" photomask is less than 5 minutes, not including the prep time. The whole photomask writing process can be completed in half an hour, giving the users unmatched flexibility for fast-prototyping of micro devices.

Alfa Chemistry is dedicated to the development of new manufacturing theories, methods, and processes that enable deeper research in manufacturing science. Our Transparency Photomask Writer-based nanofabrication services will provide you with the most solid support for your materials research. If you are interested, please feel free to contact us.

For research use only, not intended for any clinical use.

Online Inquiry

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