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Metal Nitrates as Precursors for Metal Oxide Thin Films for Electronics and Energy Applications

Original Article:
Unique chemistries of metal-nitrate precursors to form metal-oxide thin films from solution: materials for electronic and energy applications

Elizabeth A. Cochran, et al.

J. Mater. Chem. A, 2019,7, 24124-24149

10.1039/C9TA07727H

Metal nitrates are compounds consisting of metal ions bonded to one or more nitrate ions. A large number of studies have confirmed that metal nitrates can be used as precursors for solution deposition to prepare high-quality metal oxide films, and they can further play a role in the fields of electronics and energy. In this work, the researchers review the solid-state bulk, solution, and thin-film chemistry of metal nitrates.

Thermogravimetric analysis (TGA) of metal nitrates used as solution precursors is shown as figure.

1. The high decomposition temperatures (Td) of Y(NO3)3 and La(NO3)3 in air (386 and 445 °C, respectively) make them unsuitable as dielectrics for flexible TFTs on polyimide substrates layer, which softens and deforms above 275 °C. Suitable substitutes include Al(NO3)3 or Ga(NO3)3, as these salts decompose substantially at 150 °C.

2. Pairing a high Td salt such as La(NO3)3 with a low Td salt such as Al(NO3)3 or ZrO(NO3)2 in a ternary oxide composition can effectively reduce the overall Td of the thin film system.

Chemicals Related in the Paper:

Catalog Number Product Name Structure CAS Number Price
ACM100587948 Lanthanum(III) Nitrate Hydrate Lanthanum(III) Nitrate Hydrate 100587-94-8 Price
ACM10361930 Yttrium nitrate hexahydrate Yttrium nitrate hexahydrate 10361-93-0 Price
ACM13473900 Aluminum nitrate Aluminum nitrate 13473-90-0 Price
ACM135886703 GALLIUM NITRATE GALLIUM NITRATE 135886-70-3 Price
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